HALO RP H2O – trace level moisture analysis at reduced pressure conditions

It’s one thing to monitor and have high confidence in your high purity bulk and specialty gases at the post-purifier stage, but a lot can change as that same gas then travels through the various fab distribution systems and arrives at the equipment or process chamber. Unless you are monitoring close to the substrate or in the process chamber exhaust, there is the risk that high partial pressures of moisture are present during processing, resulting in defects causing yield loss and reliability issues.

For example, in semiconductor fabrication, moisture present in low-temperature epitaxy (LTE) can affect the quality and strain of the epi layers. In HB-LED fabrication, MOCVD processing with high moisture present in NH3, can lead to significant reduction in luminescence and yield loss.

Able to operate in a pressure range from 50 Torr to 15 psig, the HALO RP H2O moisture analyzer provides users with the unmatched accuracy, reliability, speed of response and ease of operation. Monitoring for contaminants close to the substrate or in the process chamber exhaust significantly reduces the risk of process issues that cause product yield losses.

HALO RP H2O features

  • Low parts per billion (ppb) moisture detection capability in inert, acid and hydride gases
  • Absolute measurement (freedom from calibration gases)
  • Wide dynamic range—over four orders of magnitude
  • Low cost of ownership and operational simplicity
  • Clean technology—no external calibration gases required
  • Compact analyzer footprint
  • CRDS technology, designated by SEMI-F112 06-13 Standard


  • Gas Quality Control
  • UHP Ammonia & High-Brightness LEDs
  • Research & Development
  • Semiconductor Process Tools

Learn More


Laboratory & Scientific

Stack, Process & CEMS

Detection Capability

Detection and Matrix Range LDL (3σ) Precision (1σ) @ zero
H2O in H2 0 – 20 ppm 1.5 ppb 0.5 ppb
H2O in N2 0 – 20 ppm 1.5 ppb 0.5 ppb
H2O in Ar 0 – 20 ppm 1.5 ppb 0.5 ppb
H2O in He 0 – 12 ppm 1.0 ppb 0.3 ppb
H2O in HCl
(may require Hastelloy®)
0 – 25 ppm 3 ppb 1.0 ppb


Operating range See Detection Capability table
Detection limit (LDL, 3σ/24h) See Detection Capability table
Precision (1σ, greater of) ± 1% or 1/3 of LDL
Accuracy (greater of) ± 4% or LDL
Speed of response < 3 minutes to 95%
Environmental conditions 10°C to 40°C, 30% to 80% RH (non-condensing)
Storage temperature -10°C to 50°C
Gas Handling System and Conditions*
Wetted materials 316L stainless steel (optional corrosion-resistant material), 10 Ra surface finish
Gas connections 1/4″ male VCR inlet & outlet
Leak tested to 1 x 10-9 mbar l / sec
Inlet pressure 50 torr – 15 psig (0.07 – 2 bara)
Outlet pressure <10 Torr (13 mbar)
Flow rate 0.1 to 1.0 slpm
Sample gases H2, N2, Ar, HCl, and others
Gas temperature Up to 60°C
Dimensions, H x W x D
Standard sensor (incl. shutoff valves) 8.73″ x 8.57″ x 26.4″ (222 mm x 218 mm x 670 mm)
Sensor rack (fits up to two sensors) 8.73″ x 19.0″ x 26.4″ (222 mm x 483 mm x 670 mm)
Standard sensor 30 lbs (13.4 kg)
Alarm indicators 2 user programmable, 1 system fault, Form C relays
Power requirements 90 – 240 VAC 50/60 Hz
Power consumption 40 Watts max.
Signal output Isolated 4–20 mA per sensor
User interfaces 5.7″ LCD touchscreen, 10/100 Base-T Ethernet, RS-232
802.11g Wireless (optional), Modbus TCP (optional)
U.S. Patent #7,277,177
*Vacuum source required

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