HALO RP H2O – trace level moisture analysis at reduced pressure conditions
Able to operate in a pressure range from 50 Torr to 15 psig, the HALO RP H2O moisture analyzer allows monitoring for contaminants close to the substrate or in the process chamber exhaust, significantly reducing the risk of problems that cause product yield losses.
Bulk and specialty gases may be OK at the post-purifier stage, but as gas travels through the various fab distribution systems and arrives at the equipment or process chamber, there is a risk that high partial pressures of moisture are present during processing, resulting in defects, yield loss and reliability issues.
For example, in semiconductor fabrication, moisture present in low-temperature epitaxy (LTE) can affect the quality and strain of the epi layers. In HB-LED fabrication, MOCVD processing with high moisture present in NH3, can lead to significant reduction in luminescence and yield loss.
HALO RP H2O features
- Low parts per billion (ppb) moisture detection capability in inert, acid and hydride gases
- Absolute measurement (freedom from calibration gases)
- Wide dynamic range—over four orders of magnitude
- Low cost of ownership and operational simplicity
- Clean technology—no external calibration gases required
- Compact analyzer footprint
- CRDS technology, designated by SEMI-F112 06-13 Standard
Applications
- Gas Quality Control
- UHP Ammonia & High-Brightness LEDs
- Research & Development
- Semiconductor Process Tools
Process Insights also offers a new CRDS analyzer performance upgrade. Implementing dynamic data processing, the Speed+™ Analyzer Performance Upgrade Software adjusts your analyzer’s response automatically and in real-time to deliver the best performance. Benefits of Speed+ for your operations include real-time process control to ensure quality, as well as faster throughput and increased capacity to improve efficiency and profitability.
