Protect your process with the HALO QRP

Modern semiconductor deposition processes — from low-temperature epitaxy to ALD and MOCVD — operate routinely at chamber pressures far below atmosphere and approach the single-digit torr range. At the same time, process temperatures are continuously decreasing. Under these conditions, residual moisture in the chamber poses a significant threat to process quality and production yields.

Tiger Optics’ new HALO QRP is optimised to operate under these low-pressure conditions and deliver exact and reliable real-time measurement to verify moisture residue in, for example, the load lock, transfer and process chambers before H2O contaminants compromise the subsequent process step. Based on Tiger Optics’ proven Continuous-Wave Cavity Ring-Down Spectroscopy (CW-CRDS) technology, the HALO QRP sets new standards in ease-of-use and measurement precision for this application, and operates at chamber pressures as low as 1 Torr.

Designed for trace level moisture analysis in low pressure (<50 Torr) applications, the HALO QRP offers:

  • Moisture detection at partial pressure of 1 µTorr and below
  • Absolute accuracy and excellent precision
  • Wide dynamic range—over four orders of magnitude
  • Low cost of ownership and operational simplicity
  • Clean technology—no external calibration gases required
  • Compact analyzer footprint, also available as OEM module for equipment/system integration.

Detection Limit and Sensitivity in Concentration Units (ppb)



  • Gas Quality Control
  • UHP Ammonia & High-Brightness LEDs
  • Research & Development
  • Semiconductor Process Tools.



Laboratory & Scientific

Stack, Process & CEMS

Detection Capability

(Matrix independent)
Range LDL (peak-to-peak) Sensitivity (3σ)
H2O 0 – 12 mTorrpp
(1200 ppm @ 10 Torr)
1 μTorrpp
(see chart for ppb units)
0.5 μTorrpp
(see chart for ppb units)


Operating range See Detection Capability table
Detection limit (LDL, 24 h peak-to-peak) See Detection Capability table
Sensitivity (3σ) See Detection Capability table
Precision (1σ, greater of) ± 1% or 1/3 of Sensitivity
Accuracy (greater of) ± 5% or 1/2 of LDL
Speed of response 1 to 2 minutes (if not flow-limited)
Environmental conditions 10°C to 40°C, 30% to 80% RH (non-condensing)
Storage temperature -10°C to 50°C
Gas Handling System and Conditions*
Wetted materials 316L stainless steel (corrosive gas version optional), 10 Ra surface finish
Gas connections 1/4″ male VCR inlet & outlet
Leak tested to 1 x 10-9 mbar l / sec
Inlet pressure 1 – 1000 Torr
Outlet pressure <20 mTorr (0.027 mbar)
Sample gases§ N2, H2, HCl, Ar (standard)
He, Cl2 (optional)
Gas temperature Up to 60°C (in detection cell)
Dimensions, H x W x D
Standard sensor (incl. shutoff valves) 8.73″ x 8.57″ x 26.4″ (222 mm x 218 mm x 670 mm)
Sensor rack (fits up to two sensors) 8.73″ x 19.0″ x 26.4″ (222 mm x 483 mm x 670 mm)
Standard sensor 30 lbs (13.4 kg)
Alarm indicators 2 user programmable, 1 system fault, Form C relays
Power requirements 90 – 240 VAC 50/60 Hz
Power consumption 40 Watts max.
Signal output Isolated 4–20 mA per sensor
User interfaces 5.7″ LCD touchscreen (display-less version optional)
10/100 Base-T Ethernet, RS-232
802.11g Wireless (optional), Modbus TCP (optional)
U.S. Patent #7,277,177
*Vacuum source required
Pressure requirements for moisture measurement −
for gas purge in standby mode, inlet pressure limit
is 15 psig (1500 Torr)
§HCl and Cl2 sample gases may require corrosive gas
version, please contact us for more information.

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